Invention Grant
US08723147B2 Extreme ultraviolet light source with a debris-mitigated and cooled collector optics
失效
极紫外光源具有碎片减轻和冷却的收集器光学元件
- Patent Title: Extreme ultraviolet light source with a debris-mitigated and cooled collector optics
- Patent Title (中): 极紫外光源具有碎片减轻和冷却的收集器光学元件
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Application No.: US13262184Application Date: 2010-03-25
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Publication No.: US08723147B2Publication Date: 2014-05-13
- Inventor: Reza Abhari , Andrea Giovannini , Bob Rollinger , Davide Bleiner
- Applicant: Reza Abhari , Andrea Giovannini , Bob Rollinger , Davide Bleiner
- Applicant Address: CH Zürich
- Assignee: ETH Zürich
- Current Assignee: ETH Zürich
- Current Assignee Address: CH Zürich
- Agency: Pauley Petersen & Erickson
- Priority: EP09004867 20090402
- International Application: PCT/EP2010/001874 WO 20100325
- International Announcement: WO2010/112171 WO 20101007
- Main IPC: H05G2/00
- IPC: H05G2/00 ; G21K5/00
Abstract:
The extreme ultraviolet light source comprises a production site capable of producing extreme ultraviolet radiation in a laser-produced plasma (3), and a collector optics (6) for collimating the extreme ultraviolet radiation. A pressurized influx of gas forms a gas curtain between the production site and the collector optics (6) in order to protect the collector optics (6) from debris (4) generated at the production site. The gas influx is directed in a way that it follows the surface of the collector optics (6). By thus shielding the collector optics (6) from the debris (4) its lifetime is enhanced. The shielding gas can further be used for cooling the collector optics (6).
Public/Granted literature
- US20120025109A1 EXTREME ULTRAVIOLET LIGHT SOURCE WITH A DEBRIS-MITIGATED AND COOLED COLLECTOR OPTICS Public/Granted day:2012-02-02
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