Invention Grant
- Patent Title: Hybrid Fin field-effect transistors
- Patent Title (中): 混合Fin场效应晶体管
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Application No.: US13463869Application Date: 2012-05-04
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Publication No.: US08723223B2Publication Date: 2014-05-13
- Inventor: Krishna Kumar Bhuwalka
- Applicant: Krishna Kumar Bhuwalka
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater and Matsil, L.L.P.
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A hybrid Fin Field-Effect Transistor (FinFET) includes a first and a second FinFET. The first FinFET includes a first channel region formed of a first semiconductor fin, and a first source region and a first drain region of a first conductivity type. The second FinFET includes a second channel region formed of a second semiconductor fin, a second source region of a second conductivity type opposite the first conductivity type, and a second drain region of the first conductivity type. The second source region and the second drain region are connected to opposite ends of the second channel region. The first and the second gate electrodes are interconnected. The first and the second source regions are electrically interconnected. The first and the second drain regions are electrically interconnected.
Public/Granted literature
- US20130134522A1 Hybrid Fin Field-Effect Transistors Public/Granted day:2013-05-30
Information query
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