Invention Grant
US08724075B2 Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice
有权
光学元件，基于其使用的曝光装置，曝光方法和微型装置的制造方法
- Patent Title: Optical element, exposure apparatus based on the use of the same, exposure method, and method for producing microdevice
- Patent Title (中): 光学元件，基于其使用的曝光装置，曝光方法和微型装置的制造方法
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Application No.: US12923282Application Date: 2010-09-13
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Publication No.: US08724075B2Publication Date: 2014-05-13
- Inventor: Takao Kokubun , Ryuichi Hoshika
- Applicant: Takao Kokubun , Ryuichi Hoshika
- Applicant Address: JP Tokyo
- Assignee: Nikon Corporation
- Current Assignee: Nikon Corporation
- Current Assignee Address: JP Tokyo
- Agency: Oliff PLC
- Priority: JP2005-250556 20050831; JP2006-026516 20060203
- Main IPC: G03B27/52
- IPC: G03B27/52
Abstract:
An optical element includes a base material, a liquid-repellent member provided on at least a part of a surface of the base material, and a light-reducing member provided between the base material and the liquid-repellent member to protect the liquid-repellent member from radiation of light by reducing the light. The optical element is usable for a liquid immersion exposure apparatus for exposing a substrate through a liquid. It is possible to avoid any inflow of the liquid in a liquid immersion area into an unexpected place via the optical element.
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