Invention Grant
US08727708B2 Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component
有权
反射装置，连通管，排气泵，排气系统，清洁系统的方法，用于实施该方法的存储介质存储程序，基板处理装置和颗粒捕获部件
- Patent Title: Reflecting device, communicating pipe, exhausting pump, exhaust system, method for cleaning the system, storage medium storing program for implementing the method, substrate processing apparatus, and particle capturing component
- Patent Title (中): 反射装置，连通管，排气泵，排气系统，清洁系统的方法，用于实施该方法的存储介质存储程序，基板处理装置和颗粒捕获部件
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Application No.: US13047370Application Date: 2011-03-14
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Publication No.: US08727708B2Publication Date: 2014-05-20
- Inventor: Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato , Eiichi Sugawara , Shosuke Endoh , Masaki Fujimori
- Applicant: Tsuyoshi Moriya , Takahiro Murakami , Yoshiyuki Kobayashi , Tetsuji Sato , Eiichi Sugawara , Shosuke Endoh , Masaki Fujimori
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2005-058108 20050302; JP2005-310545 20051025; JP2005-344663 20051129; JP2006-005344 20060112
- Main IPC: F04D29/70
- IPC: F04D29/70 ; F04D19/04
Abstract:
A reflecting device that enables to prevent infiltration of particles into a processing chamber. The reflecting device is disposed in a communicating pipe. The communicating pipe allows the processing chamber of a substrate processing apparatus and an exhaust pump to communicate with each other. The exhaust pump has at least one rotary blade. The reflecting device comprises at least one reflecting surface. The at least one reflecting surface is oriented to the exhausting pump.
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