Invention Grant
US08728331B2 Methods of fabricating imprint mold and of forming pattern using the imprint mold
有权
使用压印模具制造压印模具和成型图案的方法
- Patent Title: Methods of fabricating imprint mold and of forming pattern using the imprint mold
- Patent Title (中): 使用压印模具制造压印模具和成型图案的方法
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Application No.: US12961983Application Date: 2010-12-07
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Publication No.: US08728331B2Publication Date: 2014-05-20
- Inventor: Doo Hee Jang , Dhang Kwon , Hang Sup Cho , Ho Su Kim
- Applicant: Doo Hee Jang , Dhang Kwon , Hang Sup Cho , Ho Su Kim
- Applicant Address: KR Seoul
- Assignee: LG Display Co., Ltd.
- Current Assignee: LG Display Co., Ltd.
- Current Assignee Address: KR Seoul
- Agency: Morgan, Lewis & Bockius LLP
- Priority: KR10-2009-0123605 20091211
- Main IPC: C03C15/00
- IPC: C03C15/00
Abstract:
A method of fabricating an imprint mold is disclosed. The method includes: forming a first photo resist pattern on a substrate; etching the substrate using the first photo resist pattern as an etch mask to form a first pattern in the substrate; ashing the first photo resist pattern to form a second photo resist pattern; and etching the substrate using the second photo resist pattern to form a second pattern derived from the substrate and a third pattern derived from the first pattern.
Public/Granted literature
- US20110140303A1 METHODS OF FABRICATING IMPRINT MOLD AND OF FORMING PATTERN USING THE IMPRINT MOLD Public/Granted day:2011-06-16
Information query
