Invention Grant
- Patent Title: Method and materials for double patterning
- Patent Title (中): 双重图案化的方法和材料
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Application No.: US13386510Application Date: 2010-06-22
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Publication No.: US08728335B2Publication Date: 2014-05-20
- Inventor: Peng-Fei Fu , Eric Scott Moyer , Jason D. Suhr
- Applicant: Peng-Fei Fu , Eric Scott Moyer , Jason D. Suhr
- Applicant Address: US MI Midland
- Assignee: Dow Corning Corporation
- Current Assignee: Dow Corning Corporation
- Current Assignee Address: US MI Midland
- Agency: Baltazar Gomez
- International Application: PCT/US2010/039411 WO 20100622
- International Announcement: WO2011/011140 WO 20110127
- Main IPC: B44C1/22
- IPC: B44C1/22

Abstract:
A silsesquioxane resin is applied over the patterned photo-resist and cured at the pattern surface to produce a cured silsesquioxane resin on the pattern surface. The uncured silsesquioxane resin layer is then removed leaving the cured silsesquioxane resin on the pattern surface. The cured silsesquioxane resin on horizontal surfaces is removed to expose the underlying photo-resist. This photo-resist is removed leaving a pattern of cured silsesquioxane. Optionally, the new pattern can be transferred into the underlying layer(s).
Public/Granted literature
- US20120118856A1 Method And Materials For Double Patterning Public/Granted day:2012-05-17
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