Invention Grant
- Patent Title: Droplet discharge method and droplet discharge device
- Patent Title (中): 滴液放电法和液滴放电装置
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Application No.: US12783133Application Date: 2010-05-19
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Publication No.: US08728570B2Publication Date: 2014-05-20
- Inventor: Ryotaro Matsuyama
- Applicant: Ryotaro Matsuyama
- Applicant Address: JP Tokyo
- Assignee: Seiko Epson Corporation
- Current Assignee: Seiko Epson Corporation
- Current Assignee Address: JP Tokyo
- Agency: Global IP Counselors, LLP
- Priority: JP2009-127582 20090527
- Main IPC: B05D5/06
- IPC: B05D5/06

Abstract:
A droplet discharge method is for discharging a liquid into a plurality of drawing regions partitioned on a substrate from a plurality of nozzles formed in a droplet discharge head while moving the droplet discharge head relative to the substrate. The droplet discharge method includes dividing the nozzles into a plurality of nozzle groups so that the nozzles in one of the nozzles groups face the same drawing region, correcting an amount of the liquid discharged from the nozzles so that an average value of an amount of the liquid discharged from the nozzles constituting the nozzle groups is substantially uniform among the nozzle groups, and discharging the liquid from the nozzles while the droplet discharge head is moved relative to the substrate.
Public/Granted literature
- US20100302294A1 DROPLET DISCHARGE METHOD AND DROPLET DISCHARGE DEVICE Public/Granted day:2010-12-02
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