Invention Grant
- Patent Title: Methods for introducing a first gas and a second gas into a reaction chamber
- Patent Title (中): 将第一气体和第二气体引入反应室的方法
-
Application No.: US13455483Application Date: 2012-04-25
-
Publication No.: US08728574B2Publication Date: 2014-05-20
- Inventor: Milind S. Kulkarni , Puneet Gupta , Balaji Devulapalli , Jameel Ibrahim , Vithal Revankar , Kwasi Foli
- Applicant: Milind S. Kulkarni , Puneet Gupta , Balaji Devulapalli , Jameel Ibrahim , Vithal Revankar , Kwasi Foli
- Applicant Address: US MO St. Peters
- Assignee: MEMC Electronic Materials, Inc.
- Current Assignee: MEMC Electronic Materials, Inc.
- Current Assignee Address: US MO St. Peters
- Agency: Armstrong Teasdale LLP
- Main IPC: B01J8/00
- IPC: B01J8/00 ; C01B33/027 ; B01J8/18 ; B01J8/44
Abstract:
Gas distribution units of fluidized bed reactors are configured to direct thermally decomposable compounds to the center portion of the reactor and away from the reactor wall to prevent deposition of material on the reactor wall and process for producing polycrystalline silicon product in a reactor that reduce the amount of silicon which deposits on the reactor wall.
Public/Granted literature
- US20120230903A1 METHODS FOR INTRODUCTING A FIRST GAS AND A SECEOND GAS INTO A REACTION CHAMBER Public/Granted day:2012-09-13
Information query
