Invention Grant
- Patent Title: Method of treating a surface of at least one part by means of individual sources of an electron cyclotron resonance plasma
- Patent Title (中): 通过电子回旋共振等离子体的单独源处理至少一部分表面的方法
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Application No.: US12681203Application Date: 2008-10-09
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Publication No.: US08728588B2Publication Date: 2014-05-20
- Inventor: Beat Schmidt , Christophe Heau , Philippe Maurin-Perrier
- Applicant: Beat Schmidt , Christophe Heau , Philippe Maurin-Perrier
- Applicant Address: FR Andrezieux Boutheon
- Assignee: H.E.F.
- Current Assignee: H.E.F.
- Current Assignee Address: FR Andrezieux Boutheon
- Agency: Heslin Rothenberg Farley & Mesiti P.C.
- Priority: FR0758368 20071016
- International Application: PCT/FR2008/051824 WO 20081009
- International Announcement: WO2009/053614 WO 20090430
- Main IPC: C23C16/50
- IPC: C23C16/50 ; H01J37/32 ; C23C16/458 ; C23C16/511 ; C23C16/26
Abstract:
A method of treating a surface of at least one part by individual sources of an electron cyclotron resonance plasma is characterized by subjecting the part(s) to at least one movement of revolution with regard to at least one fixed linear row of elementary sources. The linear row or rows of elementary sources are disposed parallel to the axis or axes of revolution of the part or parts.
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