Invention Grant
US08728686B2 Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors 有权
光敏组合物,可固化组合物,新化合物,可光聚合组合物,滤色器和平版印刷版前体

  • Patent Title: Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
  • Patent Title (中): 光敏组合物,可固化组合物,新化合物,可光聚合组合物,滤色器和平版印刷版前体
  • Application No.: US12174883
    Application Date: 2008-07-17
  • Publication No.: US08728686B2
    Publication Date: 2014-05-20
  • Inventor: Tomotaka Tsuchimura
  • Applicant: Tomotaka Tsuchimura
  • Applicant Address: JP Minato-Ku, Tokyo
  • Assignee: FUJIFILM Corporation
  • Current Assignee: FUJIFILM Corporation
  • Current Assignee Address: JP Minato-Ku, Tokyo
  • Agency: Buchanan Ingersoll & Rooney PC
  • Priority: JP2007-185795 20070717; JP2007-220226 20070827; JP2008-009317 20080118
  • Main IPC: G03F1/00
  • IPC: G03F1/00 G03C1/00
Photosensitive compositions, curable compositions, novel compounds, photopolymerizable compositions, color filters, and planographic printing plate precursors
Abstract:
A photosensitive composition includes a compound represented by Formula (I) and a curable composition contains the compound of Formula (I) and a polymerizable compound. A compound is represented by a Formula (1) and a photocurable composition contains the compound of Formula (1) and a polymerizable compound. In Formula (I), R, R1 and R2 each independently represent a hydrogen atom or a monovalent substituent. In Formula (1), R and B each independently represent a monovalent substituent, A represents a divalent organic group, and Ar represents an aryl group.
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