Invention Grant
- Patent Title: Resist composition and method for producing resist pattern
- Patent Title (中): 抗蚀剂组合物和抗蚀剂图案的制造方法
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Application No.: US13551860Application Date: 2012-07-18
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Publication No.: US08728707B2Publication Date: 2014-05-20
- Inventor: Koji Ichikawa , Satoshi Yamaguchi
- Applicant: Koji Ichikawa , Satoshi Yamaguchi
- Applicant Address: JP Tokyo
- Assignee: Sumitomo Chemical Company, Limited
- Current Assignee: Sumitomo Chemical Company, Limited
- Current Assignee Address: JP Tokyo
- Agency: Birch, Stewart, Kolasch & Birch, LLP
- Priority: JP2011-157539 20110719
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/20 ; G03F7/30 ; G03F7/38
Abstract:
A resist composition having a resin having a structural unit represented by the formula (I), a resin being insoluble or poorly soluble in alkali aqueous solution, but becoming soluble in an alkali aqueous solution by the action of an acid and not including the structural unit represented by the formula (I), an acid generator, and a compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23 and ring W21 are defined in the specification.
Public/Granted literature
- US20130022909A1 RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN Public/Granted day:2013-01-24
Information query
IPC分类:
