Invention Grant
US08728711B2 Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor device
有权
清洁掩模版，清洁掩模版的方法以及制造半导体器件的方法
- Patent Title: Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor device
- Patent Title (中): 清洁掩模版，清洁掩模版的方法以及制造半导体器件的方法
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Application No.: US12971468Application Date: 2010-12-17
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Publication No.: US08728711B2Publication Date: 2014-05-20
- Inventor: Yumi Nakajima , Suigen Kyoh , Ryoichi Inanami
- Applicant: Yumi Nakajima , Suigen Kyoh , Ryoichi Inanami
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Finnegan, Henderson, Farabow, Garrett & Dunner, L.L.P.
- Priority: JP2009-293859 20091225
- Main IPC: G03F7/20
- IPC: G03F7/20
Abstract:
In one embodiment, a method for cleaning a reticle stage of an extreme ultraviolet exposure apparatus is disclosed. The method can include pressing a particle catching layer of a cleaning reticle onto the reticle stage, and the cleaning reticle includes the particle catching layer formed on a substrate. The method can include peeling the cleaning reticle from the reticle stage. The method can include removing the particle catching layer from the substrate. I addition, the method can include forming a new particle catching layer on the substrate having the particle catching layer removed.
Public/Granted literature
- US20110159440A1 CLEANING RETICLE, METHOD FOR CLEANING RETICLE STAGE, AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE Public/Granted day:2011-06-30
Information query
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