Invention Grant
US08728715B2 Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate
有权
非光敏硅氧烷涂层用于加工疏水性光致成像喷嘴板
- Patent Title: Non-photosensitive siloxane coating for processing hydrophobic photoimageable nozzle plate
- Patent Title (中): 非光敏硅氧烷涂层用于加工疏水性光致成像喷嘴板
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Application No.: US13350155Application Date: 2012-01-13
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Publication No.: US08728715B2Publication Date: 2014-05-20
- Inventor: David Bernard , Paul Dryer , Bart Mansdorf , Xiaoming Wu
- Applicant: David Bernard , Paul Dryer , Bart Mansdorf , Xiaoming Wu
- Applicant Address: JP Osaka
- Assignee: Funai Electric Co., Ltd.
- Current Assignee: Funai Electric Co., Ltd.
- Current Assignee Address: JP Osaka
- Agency: Amster, Rothstein & Ebenstein LLP
- Main IPC: G03F7/26
- IPC: G03F7/26

Abstract:
A method of forming a patterned photoresist layer having a hydrophobic surface is provided. The method includes forming a photoresist layer on a substrate and image patterning. The photoresist layer may comprise a polymeric material. The imaged photoresist layer may then undergo a two-stage post-exposure bake. A surface treatment may be performed on the photoresist layer in between the two-stage post-exposure bake. The surface treatment may include applying a siloxane solution on a partially post-exposure baked photoresist layer. The post-exposure baked photoresist layer may then be developed to form the patterned photoresist layer. The method may be used to form a hydrophobic photoimageable nozzle plate of a micro-fluid ejection head having improved mechanical properties and stable hydrophobic properties.
Public/Granted literature
- US20130183450A1 NON-PHOTOSENSITIVE SILOXANE COATING FOR PROCESSING HYDROPHOBIC PHOTOIMAGEABLE NOZZLE PLATE Public/Granted day:2013-07-18
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