Invention Grant
US08728841B2 Method of manufacturing ESD resistant nitride semiconductor light emitting device with enhanced light extraction efficiency 有权
制造具有增强的光提取效率的耐ESD氮化物半导体发光器件的方法

Method of manufacturing ESD resistant nitride semiconductor light emitting device with enhanced light extraction efficiency
Abstract:
A nitride semiconductor light emitting device, and a method of manufacturing the same are disclosed. The nitride semiconductor light emitting device includes a substrate, an n-type nitride semiconductor layer disposed on the substrate and including a plurality of V-shaped pits in a top surface thereof, an active layer disposed on the n-type nitride semiconductor layer and including depressions conforming to the shape of the plurality of V-shaped pits, and a p-type nitride semiconductor layer disposed on the active layer and including a plurality of protrusions on a top surface thereof. Since the plurality of V-shaped pits are formed in the top surface of the n-type nitride semiconductor layer, the protrusions can be formed on the p-type nitride semiconductor layer as an in-situ process. Accordingly, the resistance to ESD, and light extraction efficiency are enhanced.
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