Invention Grant
- Patent Title: Method and apparatus for low inductive design pattern
- Patent Title (中): 低感应设计图案的方法和装置
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Application No.: US13418883Application Date: 2012-03-13
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Publication No.: US08728874B2Publication Date: 2014-05-20
- Inventor: Li-Tien Chang
- Applicant: Li-Tien Chang
- Applicant Address: US CA San Jose
- Assignee: Altera Corporation
- Current Assignee: Altera Corporation
- Current Assignee Address: US CA San Jose
- Agency: Womble Carlyle Sandridge & Rice LLP
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
Provided is an interleaved or wavy spatial arrangement of the micro-vias providing the electrical pathways for the power and ground leads are described. The spatial arrangement increases the coupling pairs between power and ground vias or leads. This spatial arrangement is maintained even as the micro-vias transition across a plane from a direction of travel. Thus, the charge from the decoupling capacitor is able to more efficiently be delivered as the inductances are minimized through this design.
Public/Granted literature
- US20120178217A1 METHOD AND APPARATUS FOR LOW INDUCTIVE DESIGN PATTERN Public/Granted day:2012-07-12
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