Invention Grant
- Patent Title: Non-volatile semiconductor storage device and method of manufacturing the same
- Patent Title (中): 非易失性半导体存储装置及其制造方法
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Application No.: US13723601Application Date: 2012-12-21
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Publication No.: US08728919B2Publication Date: 2014-05-20
- Inventor: Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Megumi Ishiduki , Yosuke Komori , Hiroyasu Tanaka , Ryota Katsumata , Hideaki Aochi
- Applicant: Masaru Kito , Yoshiaki Fukuzumi , Masaru Kidoh , Megumi Ishiduki , Yosuke Komori , Hiroyasu Tanaka , Ryota Katsumata , Hideaki Aochi
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2008-320590 20081217
- Main IPC: H01L21/20
- IPC: H01L21/20

Abstract:
A non-volatile semiconductor storage device includes a plurality of memory strings each having a plurality of electrically rewritable memory cells connected in series. Each of the memory strings comprising: a first semiconductor layer including a columnar portion extending in a vertical direction with respect to a substrate; a plurality of first conductive layers formed to surround side surfaces of the columnar portions via insulation layers, and formed at a certain pitch in the vertical direction, the first conductive layers functioning as floating gates of the memory cells; and a plurality of second conductive layers formed to surround the first conductive layers via insulation layers, and functioning as control electrodes of the memory cells. Each of the first conductive layers has a length in the vertical direction that is shorter than a length in the vertical direction of each of the second conductive layers.
Public/Granted literature
- US20130109157A1 NON-VOLATILE SEMICONDUCTOR STORAGE DEVICE AND METHOD OF MANUFACTURING THE SAME Public/Granted day:2013-05-02
Information query
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