Invention Grant
US08728922B2 Method for producing monocrystalline N-silicon solar cells, as well as a solar cell produced according to such a method
有权
单晶N型硅太阳能电池的制造方法以及根据这种方法制造的太阳能电池
- Patent Title: Method for producing monocrystalline N-silicon solar cells, as well as a solar cell produced according to such a method
- Patent Title (中): 单晶N型硅太阳能电池的制造方法以及根据这种方法制造的太阳能电池
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Application No.: US12735751Application Date: 2009-02-11
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Publication No.: US08728922B2Publication Date: 2014-05-20
- Inventor: Hans-Joachim Krokoszinski , Jan Lossen
- Applicant: Hans-Joachim Krokoszinski , Jan Lossen
- Applicant Address: DE Bonn
- Assignee: SolarWorld Industries-Thueringen GmbH
- Current Assignee: SolarWorld Industries-Thueringen GmbH
- Current Assignee Address: DE Bonn
- Agency: Kenyon & Kenyon LLP
- Priority: DE102008009268 20080215; DE102008013446 20080310
- International Application: PCT/EP2009/051569 WO 20090211
- International Announcement: WO2009/101107 WO 20090820
- Main IPC: H01L21/00
- IPC: H01L21/00

Abstract:
A method for producing monocrystalline n-silicon solar cells having a rear-side passivated p+ emitter and rear-side, spatially separate heavily doped n++-base regions near the surface, as well as an interdigitated rear-side contact finger structure, which is in conductive connection with the p+-emitter regions and the n++-base regions. An aluminum thin layer or an aluminum-containing thin layer is first deposited on the rear side of the n-silicon wafer, and the thin layer is subsequently structured so that openings are obtained in the region of the future base contacts. In a further process step, the aluminum is then diffused into the n-silicon wafer in order to form a structured emitter layer.
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