Invention Grant
US08728988B2 Probe array base, method for manufacturing probe array base, method for manufacturing probe array
有权
探针阵列基座,探针阵列基底制造方法,探针阵列制造方法
- Patent Title: Probe array base, method for manufacturing probe array base, method for manufacturing probe array
- Patent Title (中): 探针阵列基座,探针阵列基底制造方法,探针阵列制造方法
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Application No.: US13487605Application Date: 2012-06-04
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Publication No.: US08728988B2Publication Date: 2014-05-20
- Inventor: Teruhisa Shibahara
- Applicant: Teruhisa Shibahara
- Applicant Address: JP Nagaokakyo-Shi, Kyoto-fu
- Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee: Murata Manufacturing Co., Ltd.
- Current Assignee Address: JP Nagaokakyo-Shi, Kyoto-fu
- Agency: Dickstein Shapiro LLP
- Priority: JP2006-002736 20060110
- Main IPC: C40B60/00
- IPC: C40B60/00

Abstract:
A probe array base including probe-holding portions which are periodically arranged on a solid base member and which have grooves is prepared by anisotropically etching a single-crystalline silicon substrate. Probe solutions are supplied to the probe-holding portions by capillary action from a plurality of tank arrays having a certain cylinder period. This allows a probe array to be completed. The probe array is used as, for example, a DNA or antigen chip, has a high degree of integration, and is capable of holding a constant and sufficient number of probe molecules.
Public/Granted literature
- US20120238474A1 PROBE ARRAY BASE, METHOD FOR MANUFACTURING PROBE ARRAY BASE, METHOD FOR MANUFACTURING PROBE ARRAY Public/Granted day:2012-09-20
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