Invention Grant
US08729215B2 Sacrificial polymer compositions including polycarbonates having repeat units derived from stereospecific polycyclic 2,3-diol monomers
有权
牺牲聚合物组合物包括具有衍生自立体特异性多环2,3-二醇单体的重复单元的聚碳酸酯
- Patent Title: Sacrificial polymer compositions including polycarbonates having repeat units derived from stereospecific polycyclic 2,3-diol monomers
- Patent Title (中): 牺牲聚合物组合物包括具有衍生自立体特异性多环2,3-二醇单体的重复单元的聚碳酸酯
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Application No.: US14038858Application Date: 2013-09-27
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Publication No.: US08729215B2Publication Date: 2014-05-20
- Inventor: Andrew Bell , Robert A. Shick , Leah Langsdorf , Keitaro Seto , W. C. Peter Tsang
- Applicant: Promerus, LLC
- Applicant Address: US OH Brecksville
- Assignee: Promerus, LLC
- Current Assignee: Promerus, LLC
- Current Assignee Address: US OH Brecksville
- Agent Balaram Gupta
- Main IPC: C08G64/10
- IPC: C08G64/10 ; C08G63/02
Abstract:
Embodiments according to the present invention relate to sacrificial polymer compositions that include polycarbonate polymers having repeat units derived from stereospecific polycyclic 2,3-diol monomers. The sacrificial polymer compositions also include an acid generator that is selected from at least one photoacid generator and/or at least one thermal acid generator. In addition, embodiments according to the present invention relate to a method of forming a structure that includes a three-dimensional space interposed between a substrate and an overcoat layer, and a method of temporarily bonding first and second substrates together, which make use of the polycarbonate polymers.
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