Invention Grant
- Patent Title: Microchannel plate and its manufacturing method
- Patent Title (中): 微通道板及其制造方法
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Application No.: US13383001Application Date: 2010-07-08
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Publication No.: US08729447B2Publication Date: 2014-05-20
- Inventor: Pierre Jarron , Nicolas Wyrsch
- Applicant: Pierre Jarron , Nicolas Wyrsch
- Applicant Address: CH Lausanne
- Assignee: Ecole Polytechnique Federale de Lausanne (EPFL)
- Current Assignee: Ecole Polytechnique Federale de Lausanne (EPFL)
- Current Assignee Address: CH Lausanne
- Agency: Young & Thompson
- Priority: EP09166019 20090721
- International Application: PCT/EP2010/059774 WO 20100708
- International Announcement: WO2011/009730 WO 20110127
- Main IPC: H01J40/14
- IPC: H01J40/14 ; H01J43/00

Abstract:
A microchannel plate (1) having an array of channels (5),includes a substrate (2) and, deposited on the substrate, a hydrogenated amorphous silicon film (3) having a thickness ranging between 50 μm and 200 μm, preferably between 80 μm and 120 μm, the film including the array of channels (5). Preferably, the substrate (2) is an integrated circuit having an internal electronic readout circuit and pixilated collection electrodes (8), and the film (3) is integrated on the substrate (2). The channels (5) may be formed by a Deep Reactive Ion Etching (DRIE) process.
Public/Granted literature
- US20120187278A1 MICROCHANNEL PLATE AND ITS MANUFACTURING METHOD Public/Granted day:2012-07-26
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