Invention Grant
- Patent Title: Ultraviolet irradiation device for implants
- Patent Title (中): 用于植入物的紫外线照射装置
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Application No.: US13991568Application Date: 2011-10-18
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Publication No.: US08729501B2Publication Date: 2014-05-20
- Inventor: Yoshimasa Ogawa
- Applicant: Yoshimasa Ogawa
- Applicant Address: JP Chiyoda-Ku, Tokyo
- Assignee: Ushio Denki Kabushiki Kaisha
- Current Assignee: Ushio Denki Kabushiki Kaisha
- Current Assignee Address: JP Chiyoda-Ku, Tokyo
- Agency: Fitzpatrick, Cella, Harper & Scinto
- Priority: JP2011-017434 20110131
- International Application: PCT/JP2011/073921 WO 20111018
- International Announcement: WO2012/105094 WO 20120809
- Main IPC: A61L2/10
- IPC: A61L2/10

Abstract:
Disclosed herein is an ultraviolet irradiation device for removing organic contaminants from implants using ultraviolet rays. In the present invention, the implants can be easily and smoothly put into or pulled out of a processing chamber, and the implants can be reliably prevented from being recontaminated after the ultraviolet irradiation process has finished. For this, the ultraviolet irradiation device includes a housing provided with an openable door, an ultraviolet lamp installed in the housing, a carriage provided in the housing so as to be extractable, and an implant mount unit placed on the carriage in such a way that the implant mount unit can be disposed facing the ultraviolet lamp in the housing. The implant mount unit includes a mounting board removably placed on the carriage, and an implant support removably placed on the mounting board.
Public/Granted literature
- US20130264495A1 ULTRAVIOLET IRRADIATION DEVICE FOR IMPLANTS Public/Granted day:2013-10-10
Information query
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