A drawing apparatus performs drawing on a substrate with a plurality of charged particle beams. The apparatus comprises a stage configured to hold the substrate and to be moved; a projection system configured to project the plurality of charged particle beams onto the substrate; a measurement device configured to detect a charged particle beam that reaches the measurement device due to a charged particle beam incident, via the projection system, on a mark formed on the substrate, to measure a position of the mark; and a controller. The controller is configured to control operations of the projection system and the measurement device so that the position of the mark is measured with at least one of the plurality of charged particle beams, in parallel with drawing on the substrate with a part of the plurality of charged particle beams.