Invention Grant
- Patent Title: Memory constructions comprising thin films of phase change material
- Patent Title (中): 包含相变材料薄膜的记忆结构
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Application No.: US13658691Application Date: 2012-10-23
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Publication No.: US08729522B2Publication Date: 2014-05-20
- Inventor: Andrea Redaelli
- Applicant: Micron Technology, Inc.
- Applicant Address: US ID Boise
- Assignee: Micron Technology, Inc.
- Current Assignee: Micron Technology, Inc.
- Current Assignee Address: US ID Boise
- Agency: Wells St. John P.S.
- Main IPC: H01L29/02
- IPC: H01L29/02

Abstract:
Some embodiments include memory constructions having a film of phase change material between first and second materials; with the entirety of film having a thickness of less than or equal to about 10 nanometers. The memory constructions are configured to transit from one memory state having a first phase of the phase change material to a second memory state having a second phase of the phase change material, and are configured so that an entirety of the phase change material film changes from the first phase to the second phase in transitioning from the first memory state to the second memory state. In some embodiments, at least one of the first and second materials may be carbon, W, TiN, TaN or TiAlN. In some embodiments, at least one of the first and second materials may be part of a structure having bands of two or more different compositions.
Public/Granted literature
- US20140110658A1 MEMORY CONSTRUCTIONS COMPRISING THIN FILMS OF PHASE CHANGE MATERIAL Public/Granted day:2014-04-24
Information query
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