Invention Grant
- Patent Title: GaN-based semiconductor element
- Patent Title (中): GaN基半导体元件
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Application No.: US13444936Application Date: 2012-04-12
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Publication No.: US08729603B2Publication Date: 2014-05-20
- Inventor: Nariaki Ikeda , Seikoh Yoshida
- Applicant: Nariaki Ikeda , Seikoh Yoshida
- Applicant Address: JP Tokyo
- Assignee: Furukawa Electric Co., Ltd.
- Current Assignee: Furukawa Electric Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Lowe Hauptman & Ham, LLP
- Priority: JP2007-076004 20070323
- Main IPC: H01L29/205
- IPC: H01L29/205

Abstract:
A GaN-based semiconductor element includes a substrate, a buffer layer formed on the substrate, including an electrically conductive portion, an epitaxial layer formed on the buffer layer, and a metal structure in ohmic contact with the electrically conductive portion of the buffer layer for controlling an electric potential of the buffer layer.
Public/Granted literature
- US20120193639A1 GaN-BASED SEMICONDUCTOR ELEMENT Public/Granted day:2012-08-02
Information query
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