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US08729609B2 Integrated circuits including multi-gate transistors locally interconnected by continuous fin structure and methods for the fabrication thereof 有权
集成电路包括通过连续鳍结构局部互连的多栅极晶体及其制造方法

Integrated circuits including multi-gate transistors locally interconnected by continuous fin structure and methods for the fabrication thereof
Abstract:
Embodiments of an integrated circuit are provided. In one embodiment, the integrated circuit includes a substrate and a plurality of locally interconnected multi-gate transistors. The plurality of locally interconnected multi-gate transistors includes a continuous fin structure formed on the substrate and first and second multi-gate transistors formed on the substrate and including first and second fin segments of the continuous fin structure, respectively. The continuous fin structure electrically interconnects the first and second multi-gate transistors.
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