Invention Grant
- Patent Title: Semiconductor device having a plurality of fins with different heights and method for manufacturing the same
- Patent Title (中): 具有多个具有不同高度的翅片的半导体器件及其制造方法
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Application No.: US13503693Application Date: 2011-11-18
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Publication No.: US08729611B2Publication Date: 2014-05-20
- Inventor: Huilong Zhu , Haizhou Yin , Zhijiong Luo
- Applicant: Huilong Zhu , Haizhou Yin , Zhijiong Luo
- Applicant Address: CN Beijing
- Assignee: Institute of Microelectronics, Chinese Academy of Sciences
- Current Assignee: Institute of Microelectronics, Chinese Academy of Sciences
- Current Assignee Address: CN Beijing
- Agency: Osha Liang LLP
- Priority: CN201110265073 20110908
- International Application: PCT/CN2011/082399 WO 20111118
- International Announcement: WO2013/033952 WO 20130314
- Main IPC: H01L27/088
- IPC: H01L27/088

Abstract:
The present disclosure provides a semiconductor device and a method for manufacturing the same. The semiconductor device comprises: a semiconductor layer comprising a plurality of semiconductor sub-layers; and a plurality of fins formed in the semiconductor layer and adjoining the semiconductor layer, wherein at least two of the plurality of fins comprise different numbers of the semiconductor sub-layers and have different heights. According to the present disclosure, a plurality of semiconductor devices with different dimensions and different driving abilities can be integrated on a single wafer.
Public/Granted literature
- US20130062672A1 SEMICONDUCTOR DEVICE AND METHOD FOR MANUFACTURING THE SAME Public/Granted day:2013-03-14
Information query
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