Invention Grant
- Patent Title: Nonvolatile semiconductor memory device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US11723483Application Date: 2007-03-20
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Publication No.: US08729620B2Publication Date: 2014-05-20
- Inventor: Shunpei Yamazaki , Yoshinobu Asami , Tamae Takano , Makoto Furuno
- Applicant: Shunpei Yamazaki , Yoshinobu Asami , Tamae Takano , Makoto Furuno
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2006-077894 20060321
- Main IPC: H01L29/788
- IPC: H01L29/788

Abstract:
It is an object to provide a nonvolatile semiconductor memory device having excellent writing property and charge-retention property. A semiconductor layer including a channel forming region between a pair of impurity regions which are formed to be apart from each other is provided. In an upper layer portion thereof, a first insulating layer, a floating gate, a second insulating layer, and a control gate are provided. The floating gate has at least a two-layer structure, and a first layer in contact with the first insulating layer preferably has a band gap smaller than that of the semiconductor layer. Furthermore, by setting an energy level at the bottom of the conduction band of the floating gate lower than that of the channel forming region of the semiconductor layer, injectability of carriers and a charge-retention property can be improved.
Public/Granted literature
- US20070235793A1 Nonvolatile semiconductor memory device Public/Granted day:2007-10-11
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