Invention Grant
US08730317B2 Substrate processing apparatus, substrate processing method and non-transitory computer storage medium
有权
基板处理装置,基板处理方法和非暂时性计算机存储介质
- Patent Title: Substrate processing apparatus, substrate processing method and non-transitory computer storage medium
- Patent Title (中): 基板处理装置,基板处理方法和非暂时性计算机存储介质
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Application No.: US13174322Application Date: 2011-06-30
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Publication No.: US08730317B2Publication Date: 2014-05-20
- Inventor: Norihisa Koga
- Applicant: Norihisa Koga
- Applicant Address: JP Tokyo
- Assignee: Tokyo Electron Limited
- Current Assignee: Tokyo Electron Limited
- Current Assignee Address: JP Tokyo
- Agency: Posz Law Group, PLC
- Priority: JP2010-161713 20100716
- Main IPC: H04N7/18
- IPC: H04N7/18

Abstract:
A substrate processing apparatus includes: a holding unit holding a substrate; a rotation driving unit rotating the substrate held on the holding unit; a moving mechanism moving the holding unit between a delivery position and an edge exposure position; an exposure unit provided on the edge exposure position side and exposing an edge portion of a coating film above the substrate held on the holding unit; an image capturing unit provided on the edge exposure position side and above the exposure unit and capturing an image of the substrate held on the holding unit; and a direction change unit changing a direction of an optical path formed between the substrate held on the holding unit and the image capturing unit. The direction change unit includes a first reflecting mirror, a second reflecting mirror, and a third reflecting mirror.
Public/Granted literature
- US20120013730A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD AND NON-TRANSITORY COMPUTER STORAGE MEDIUM Public/Granted day:2012-01-19
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