Invention Grant
US08730317B2 Substrate processing apparatus, substrate processing method and non-transitory computer storage medium 有权
基板处理装置,基板处理方法和非暂时性计算机存储介质

  • Patent Title: Substrate processing apparatus, substrate processing method and non-transitory computer storage medium
  • Patent Title (中): 基板处理装置,基板处理方法和非暂时性计算机存储介质
  • Application No.: US13174322
    Application Date: 2011-06-30
  • Publication No.: US08730317B2
    Publication Date: 2014-05-20
  • Inventor: Norihisa Koga
  • Applicant: Norihisa Koga
  • Applicant Address: JP Tokyo
  • Assignee: Tokyo Electron Limited
  • Current Assignee: Tokyo Electron Limited
  • Current Assignee Address: JP Tokyo
  • Agency: Posz Law Group, PLC
  • Priority: JP2010-161713 20100716
  • Main IPC: H04N7/18
  • IPC: H04N7/18
Substrate processing apparatus, substrate processing method and non-transitory computer storage medium
Abstract:
A substrate processing apparatus includes: a holding unit holding a substrate; a rotation driving unit rotating the substrate held on the holding unit; a moving mechanism moving the holding unit between a delivery position and an edge exposure position; an exposure unit provided on the edge exposure position side and exposing an edge portion of a coating film above the substrate held on the holding unit; an image capturing unit provided on the edge exposure position side and above the exposure unit and capturing an image of the substrate held on the holding unit; and a direction change unit changing a direction of an optical path formed between the substrate held on the holding unit and the image capturing unit. The direction change unit includes a first reflecting mirror, a second reflecting mirror, and a third reflecting mirror.
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