Invention Grant
- Patent Title: Interferometric measurement of displacement in axial direction of a grating
- Patent Title (中): 光栅轴向位移的干涉测量
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Application No.: US13438615Application Date: 2012-04-03
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Publication No.: US08730483B2Publication Date: 2014-05-20
- Inventor: Masato Ikeda , Katsuhiro Oyama
- Applicant: Masato Ikeda , Katsuhiro Oyama
- Applicant Address: JP Tokyo
- Assignee: Taiyo Yuden Co., Ltd.
- Current Assignee: Taiyo Yuden Co., Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Chen Yoshimura LLP
- Priority: JP2009-231845 20091005; JP2010-084081 20100331
- Main IPC: G01B9/02
- IPC: G01B9/02

Abstract:
A displacement measurement device includes a first diffraction grating that generates first diffraction light of a prescribed order; a second diffraction grating movable relative to the first diffraction grating, the second diffraction grating dividing the zeroth-order light that has passed through the first diffraction grating into zeroth-order light and a second diffraction light of a prescribed order; and a first optical sensor that detects interfering light beams formed by the first diffraction light from the first diffraction grating and the second diffraction light from the second diffraction grating to determine an amount of a displacement of the second diffraction grating relative to the first diffraction grating.
Public/Granted literature
- US20120250031A1 DISPLACEMENT MEASUREMENT METHOD AND DISPLACEMENT MEASUREMENT DEVICE Public/Granted day:2012-10-04
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