Invention Grant
- Patent Title: Method for analysing photovoltaic layer systems using thermography
- Patent Title (中): 使用热成像分析光伏层系统的方法
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Application No.: US13819845Application Date: 2011-09-28
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Publication No.: US08731852B2Publication Date: 2014-05-20
- Inventor: Thomas Dalibor
- Applicant: Thomas Dalibor
- Applicant Address: FR Courbevoie
- Assignee: Saint-Gobain Glass France
- Current Assignee: Saint-Gobain Glass France
- Current Assignee Address: FR Courbevoie
- Agency: Steinfl & Bruno LLP
- Priority: EP10180708 20100928
- International Application: PCT/EP2011/066898 WO 20110928
- International Announcement: WO2012/052269 WO 20120426
- Main IPC: G01R31/00
- IPC: G01R31/00 ; G01N25/72

Abstract:
A method for the evaluative analysis of a photovoltaic layer system is described. The method applies to a semiconductor layer forming a pn junction: an electric current is generated in the layer system; a spatially resolved thermal image of the surface of the layer system is generated; an intensity distribution of the thermal radiation relative to the respective number of pixels with the same intensity value is determined; an intensity mean/median from the intensity distribution is determined; an intensity interval based on a specifiable measure for a scattering of the intensity distribution is determined; a characteristic number is determined; and the characteristic number or a calculation value based thereon is compared with a specifiable reference characteristic number.
Public/Granted literature
- US20130226480A1 METHOD FOR ANALYSING PHOTOVOLTAIC LAYER SYSTEMS USING THERMOGRAPHY Public/Granted day:2013-08-29
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