Invention Grant
US08731852B2 Method for analysing photovoltaic layer systems using thermography 有权
使用热成像分析光伏层系统的方法

  • Patent Title: Method for analysing photovoltaic layer systems using thermography
  • Patent Title (中): 使用热成像分析光伏层系统的方法
  • Application No.: US13819845
    Application Date: 2011-09-28
  • Publication No.: US08731852B2
    Publication Date: 2014-05-20
  • Inventor: Thomas Dalibor
  • Applicant: Thomas Dalibor
  • Applicant Address: FR Courbevoie
  • Assignee: Saint-Gobain Glass France
  • Current Assignee: Saint-Gobain Glass France
  • Current Assignee Address: FR Courbevoie
  • Agency: Steinfl & Bruno LLP
  • Priority: EP10180708 20100928
  • International Application: PCT/EP2011/066898 WO 20110928
  • International Announcement: WO2012/052269 WO 20120426
  • Main IPC: G01R31/00
  • IPC: G01R31/00 G01N25/72
Method for analysing photovoltaic layer systems using thermography
Abstract:
A method for the evaluative analysis of a photovoltaic layer system is described. The method applies to a semiconductor layer forming a pn junction: an electric current is generated in the layer system; a spatially resolved thermal image of the surface of the layer system is generated; an intensity distribution of the thermal radiation relative to the respective number of pixels with the same intensity value is determined; an intensity mean/median from the intensity distribution is determined; an intensity interval based on a specifiable measure for a scattering of the intensity distribution is determined; a characteristic number is determined; and the characteristic number or a calculation value based thereon is compared with a specifiable reference characteristic number.
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