Invention Grant
- Patent Title: Method and apparatus for hierarchical wafer quality predictive modeling
- Patent Title (中): 分层晶圆质量预测模型的方法和装置
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Application No.: US13526152Application Date: 2012-06-18
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Publication No.: US08732627B2Publication Date: 2014-05-20
- Inventor: Robert J. Baseman , Jingrui He , Yada Zhu
- Applicant: Robert J. Baseman , Jingrui He , Yada Zhu
- Applicant Address: US NY Armonk
- Assignee: International Business Machines Corporation
- Current Assignee: International Business Machines Corporation
- Current Assignee Address: US NY Armonk
- Agency: Otterstedt, Ellenbogen & Kammer, LLP
- Agent Daniel P. Morris, Esq.
- Main IPC: G06F17/50
- IPC: G06F17/50

Abstract:
A method for performing enhanced wafer quality prediction in a semiconductor manufacturing process includes the steps of: obtaining data including at least one of tensor format wafer processing conditions, historical wafer quality measurements and prior knowledge relating to at least one of the semiconductor manufacturing process and wafer quality; building a hierarchical prediction model including at least the tensor format wafer processing conditions; and predicting wafer quality for a newly fabricated wafer based at least on the hierarchical prediction model and corresponding tensor format wafer processing conditions.
Public/Granted literature
- US20130339919A1 Method and Apparatus for Hierarchical Wafer Quality Predictive Modeling Public/Granted day:2013-12-19
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