Invention Grant
- Patent Title: Substrate and method for production thereof
- Patent Title (中): 基材及其制造方法
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Application No.: US12310994Application Date: 2007-09-13
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Publication No.: US08733557B2Publication Date: 2014-05-27
- Inventor: Hirokazu Sakaguchi , Hiroshi Takahashi , Yoshiyuki Ueno , Hiroyuki Sugaya
- Applicant: Hirokazu Sakaguchi , Hiroshi Takahashi , Yoshiyuki Ueno , Hiroyuki Sugaya
- Applicant Address: JP Tokyo
- Assignee: TORAY Industries, Inc.
- Current Assignee: TORAY Industries, Inc.
- Current Assignee Address: JP Tokyo
- Agency: Kubovcik & Kubovcik
- Priority: JP2006-250459 20060915; JP2007-048839 20070228
- International Application: PCT/JP2007/067784 WO 20070913
- International Announcement: WO2008/032758 WO 20080320
- Main IPC: A61L33/00
- IPC: A61L33/00 ; B01D63/00
Abstract:
The present invention relates to a substrate including a compound having blood anticoagulation activity and a hydrophilic polymer compound, wherein the amount of elution of the compound having blood anticoagulation activity is less than 0.6 μg/ml, and a manufacturing method of a substrate, wherein after a compound having blood anticoagulation activity and a hydrophilic compound brought in contact with a substrate are irradiated with radiation, unreacted components are washed out.
Public/Granted literature
- US20100176048A1 Substrate and method for production thereof Public/Granted day:2010-07-15
Information query
