Invention Grant
- Patent Title: Liquid discharge head substrate and liquid discharge head
- Patent Title (中): 液体排出头基板和排液头
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Application No.: US13043343Application Date: 2011-03-08
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Publication No.: US08733901B2Publication Date: 2014-05-27
- Inventor: Hideo Tamura , Yoshiyuki Imanaka , Koichi Omata , Yuji Tamaru
- Applicant: Hideo Tamura , Yoshiyuki Imanaka , Koichi Omata , Yuji Tamaru
- Applicant Address: JP Tokyo
- Assignee: Canon Kabushiki Kaisha
- Current Assignee: Canon Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Agency: Canon USA Inc. IP Division
- Priority: JP2010-054728 20100311
- Main IPC: B41J2/05
- IPC: B41J2/05

Abstract:
Performing a high-speed recording operation using a slender liquid discharge head substrate causes an uneven temperature distribution for each energy generating element because the center portion of the liquid discharge head substrate is more liable to accumulate heat than the end portion thereof, which may affect the quality of a recorded image. For this reason, the surface of the energy generating element which contacts liquid is separated into a first region and a second region in which a protection film is thicker than the one in the first region, and the area in the first region for the element positioned at the end portion of the array of the elements is made greater than that in the first region at the center portion thereof.
Public/Granted literature
- US20110221825A1 LIQUID DISCHARGE HEAD SUBSTRATE AND LIQUID DISCHARGE HEAD Public/Granted day:2011-09-15
Information query
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