Invention Grant
- Patent Title: Polishing solution for metal films and polishing method using the same
- Patent Title (中): 金属薄膜抛光液及使用其的抛光方法
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Application No.: US12937773Application Date: 2009-04-13
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Publication No.: US08734204B2Publication Date: 2014-05-27
- Inventor: Kouji Haga , Masato Fukasawa , Hiroshi Nakagawa , Kouji Mishima
- Applicant: Kouji Haga , Masato Fukasawa , Hiroshi Nakagawa , Kouji Mishima
- Applicant Address: JP Tokyo
- Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee: Hitachi Chemical Company, Ltd.
- Current Assignee Address: JP Tokyo
- Agency: Antonelli, Terry, Stout & Kraus, LLP
- Priority: JPP2008-105697 20080415; JPP2008-288644 20081111
- International Application: PCT/JP2009/057457 WO 20090413
- International Announcement: WO2009/128430 WO 20091022
- Main IPC: B24B1/00
- IPC: B24B1/00
Abstract:
A polishing solution for metal films that comprises an oxidizing agent, a metal oxide solubilizer, a metal corrosion preventing agent, a water-soluble polymer and water, wherein the water-soluble polymer is a copolymer of acrylic acid and methacrylic acid, the copolymerization ratio of methacrylic acid in the copolymer being 1-20 mol % based on the total of acrylic acid and methacrylic acid.
Public/Granted literature
- US20110104992A1 POLISHING SOLUTION FOR METAL FILMS AND POLISHING METHOD USING THE SAME Public/Granted day:2011-05-05
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