Invention Grant
- Patent Title: Process for cleaning shield surfaces in deposition systems
- Patent Title (中): 在沉积系统中清洁屏蔽表面的工艺
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Application No.: US13365077Application Date: 2012-02-02
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Publication No.: US08734586B2Publication Date: 2014-05-27
- Inventor: Vibhu Jindal , Junichi Kageyama
- Applicant: Vibhu Jindal , Junichi Kageyama
- Applicant Address: US NY Albany JP Tokyo
- Assignee: Sematech, Inc.,Asahi Glass Co., Ltd.
- Current Assignee: Sematech, Inc.,Asahi Glass Co., Ltd.
- Current Assignee Address: US NY Albany JP Tokyo
- Agency: Nixon Peabody LLP
- Agent Khaled Shami
- Main IPC: B08B7/00
- IPC: B08B7/00
Abstract:
A process for cleaning and restoring deposition shield surfaces which results in a cleaned shield having a surface roughness of between about 200 microinches and about 500 microinches and a particle surface density of less than about 0.1 particles/mm2 of particles between about 1 micron and about 5 microns in size and no particles less than about 1 micron in size and method for use thereof is disclosed.
Public/Granted literature
- US20130202991A1 PROCESS FOR CLEANING SHIELD SURFACES IN DEPOSITION SYSTEMS Public/Granted day:2013-08-08
Information query
