Invention Grant
- Patent Title: Silicate-based phosphor and manufacturing method of silicate-based phosphor
- Patent Title (中): 硅酸盐系磷光体及其制造方法
-
Application No.: US13640412Application Date: 2011-04-12
-
Publication No.: US08734680B2Publication Date: 2014-05-27
- Inventor: Kenji Toda , Mineo Sato , Kazuyoshi Uematsu , Tadashi Ishigaki , Hideo Suda , Etsuko Minegishi , Yoshiaki Kudo
- Applicant: Kenji Toda , Mineo Sato , Kazuyoshi Uematsu , Tadashi Ishigaki , Hideo Suda , Etsuko Minegishi , Yoshiaki Kudo
- Applicant Address: JP Tokyo JP Niigata
- Assignee: Lead Chemical Company, Limited,Niigata University
- Current Assignee: Lead Chemical Company, Limited,Niigata University
- Current Assignee Address: JP Tokyo JP Niigata
- Agency: Kubotera & Associates, LLC
- Priority: JP2010-092592 20100413
- International Application: PCT/JP2011/059090 WO 20110412
- International Announcement: WO2011/129331 WO 20111020
- Main IPC: C01B33/24
- IPC: C01B33/24 ; C09K11/08 ; C09K11/66

Abstract:
There are provide a silicate-based phosphor excellent in emission intensity and a manufacturing method of the same. A manufacturing method of a silicate-based phosphor is characterized by: introducing in a vessel raw material powders having a compound containing light-emitting ions selected from at least one of Eu, Ce, Mn, and Tb; and firing the raw material powders while supplying SiOx (0.5≦x≦1.9, preferably, 0.8≦x≦1.2) in a gas phase. The raw material powders preferably further contains at least one of an alkali metal compound, an alkaline-earth metal compound, a magnesium compound, and a rare-earth compound. The silicate-based phosphor is preferably M2SiO4:Eu2+ (wherein M is one or more selected from a group consisting of Ca, Sr and Ba). The firing is preferably performed by supplying the SiOx to the raw material powders in a gas atmosphere at a temperature of 1200 to 1700° C. and subjecting the raw material powders to a gas-solid phase reaction at a temperature of 700 to 1700° C.
Public/Granted literature
- US20130026414A1 SILICATE-BASED PHOSPHOR AND MANUFACTURING METHOD OF SILICATE-BASED PHOSPHOR Public/Granted day:2013-01-31
Information query