Invention Grant
- Patent Title: Self-aligned bevels for write poles
- Patent Title (中): 用于写入极的自对准斜面
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Application No.: US12777978Application Date: 2010-05-11
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Publication No.: US08734894B2Publication Date: 2014-05-27
- Inventor: David Chris Seets , Chang Xie , Christopher J. Cote , Karen Virginia Rud
- Applicant: David Chris Seets , Chang Xie , Christopher J. Cote , Karen Virginia Rud
- Applicant Address: US CA Cupertino
- Assignee: Seagate Technology LLC
- Current Assignee: Seagate Technology LLC
- Current Assignee Address: US CA Cupertino
- Agency: Westman, Champlin & Koehler, P.A.
- Main IPC: G11B5/127
- IPC: G11B5/127 ; G11B5/147 ; G11B5/265
Abstract:
A method of depositing material onto a base portion of a wafer is disclosed. The method includes forming a bevel into a portion of a surface of the base portion of the wafer and depositing a first layer of conductive material onto the beveled portion of the base portion so that part of the first layer includes a wedge shape above the surface of the base portion. A second layer of conductive material is deposited onto the base portion including the portion of the base portion onto which the first layer of material is deposited.
Public/Granted literature
- US20110281023A1 SELF-ALIGNED BEVELS FOR WRITE POLES Public/Granted day:2011-11-17
Information query
IPC分类:
