Invention Grant
- Patent Title: Non-planar lithography mask and system and methods
- Patent Title (中): 非平面光刻掩模及系统及方法
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Application No.: US13421235Application Date: 2012-03-15
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Publication No.: US08735024B2Publication Date: 2014-05-27
- Inventor: Chien-Hsuan Liu , Jen-Pan Wang
- Applicant: Chien-Hsuan Liu , Jen-Pan Wang
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Agency: Slater and Matsil, L.L.P.
- Main IPC: G03F7/24
- IPC: G03F7/24 ; G03F1/50
Abstract:
Various non-planar lithography masks, systems using such lithography masks, and methods are disclosed. An embodiment is a lithography mask comprising a lens-type transparent substrate and a reticle pattern on a surface of the lens-type transparent substrate. The reticle pattern is opaque to optical radiation. Methods for forming similar lithography masks and for using similar lithography masks are disclosed.
Public/Granted literature
- US20130244140A1 Non-Planar Lithography Mask and System and Methods Public/Granted day:2013-09-19
Information query
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