Invention Grant
- Patent Title: Method and apparatus for modifying a substrate surface of a photolithographic mask
- Patent Title (中): 用于修改光刻掩模的衬底表面的方法和装置
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Application No.: US13084991Application Date: 2011-04-12
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Publication No.: US08735030B2Publication Date: 2014-05-27
- Inventor: Sergey Oshemkov , Ralph Klaesges , Markus Mengel
- Applicant: Sergey Oshemkov , Ralph Klaesges , Markus Mengel
- Applicant Address: DE Oberkochen DE Jena IL Karmiel
- Assignee: Carl Zeiss SMT GmbH,Carl Zeiss SMS GmbH.,Carl Zeiss SMS Ltd
- Current Assignee: Carl Zeiss SMT GmbH,Carl Zeiss SMS GmbH.,Carl Zeiss SMS Ltd
- Current Assignee Address: DE Oberkochen DE Jena IL Karmiel
- Agency: Fish & Richardson P.C.
- Main IPC: G03F1/72
- IPC: G03F1/72 ; C03C15/00
Abstract:
Disclosed is a method of modifying of a surface of a substrate of a photolithographic mask for extreme ultraviolet radiation comprising the step of focusing femtosecond light pulses of a laser system onto the substrate so that a plurality of color centers is generated inside the substrate, wherein the color centers are distributed to cause a modification of the substrate surface.
Public/Granted literature
- US20110255065A1 METHOD AND APPARATUS FOR MODIFYING A SUBSTRATE SURFACE OF A PHOTOLITHOGRAPHIC MASK Public/Granted day:2011-10-20
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