Invention Grant
US08735048B2 Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method
有权
光化射线敏感或辐射敏感树脂组合物，抗蚀剂膜采用组合物和图案形成方法
- Patent Title: Actinic ray-sensitive or radiation-sensitive resin composition, resist film using the composition and pattern forming method
- Patent Title (中): 光化射线敏感或辐射敏感树脂组合物，抗蚀剂膜采用组合物和图案形成方法
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Application No.: US13575833Application Date: 2011-01-27
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Publication No.: US08735048B2Publication Date: 2014-05-27
- Inventor: Takeshi Inasaki , Takayuki Ito , Tomotaka Tsuchimura , Tadateru Yatsuo , Koutarou Takahashi
- Applicant: Takeshi Inasaki , Takayuki Ito , Tomotaka Tsuchimura , Tadateru Yatsuo , Koutarou Takahashi
- Applicant Address: JP Tokyo
- Assignee: FUJIFILM Corporation
- Current Assignee: FUJIFILM Corporation
- Current Assignee Address: JP Tokyo
- Agency: Sughrue Mion, PLLC
- Priority: JP2010-019677 20100129; JP2010-190109 20100826
- International Application: PCT/JP2011/052193 WO 20110127
- International Announcement: WO2011/093520 WO 20110804
- Main IPC: G03F7/039
- IPC: G03F7/039 ; G03F7/038 ; G03F7/20 ; G03F7/30
Abstract:
An actinic ray-sensitive or radiation-sensitive resin composition comprising (P) a resin having a repeating unit represented by the following formula (1), a resist film using the composition, and a pattern forming method.
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