Invention Grant
- Patent Title: Method of manufacturing nitride semiconductor light emitting device
- Patent Title (中): 制造氮化物半导体发光器件的方法
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Application No.: US13410773Application Date: 2012-03-02
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Publication No.: US08735196B2Publication Date: 2014-05-27
- Inventor: Masanobu Ando
- Applicant: Masanobu Ando
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Patterson & Sheridan, LLP
- Priority: JPP2011-127174 20110607
- Main IPC: H01L33/26
- IPC: H01L33/26 ; H01L21/302 ; H01L21/461

Abstract:
According to one embodiment, in a method of a nitride semiconductor light emitting device, a nitride semiconductor laminated body is formed on a first substrate having a first size. A first adhesion layer with a second size smaller than the first size is formed on the nitride semiconductor laminated body. A second adhesion layer is formed on a second substrate. The first and the second substrates are bonded while the first and second adhesion layers being overlapped each other. The first substrate is removed so as to generate a recess having a third size equal to or larger than the second size. The first substrate is etched until exposing the nitride semiconductor laminated body while injecting a chemical solution into the recess. The exposed nitride semiconductor laminated body is etched using the chemical solution so as to form a concave-convex portion in the exposed nitride semiconductor laminated body.
Public/Granted literature
- US20120315719A1 METHOD OF MANUFACTURING NITRIDE SEMICONDUCTOR LIGHT EMMITING DEVICE Public/Granted day:2012-12-13
Information query
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