Invention Grant
- Patent Title: Heterogeneous annealing method and device
- Patent Title (中): 异相退火方法及装置
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Application No.: US13599023Application Date: 2012-08-30
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Publication No.: US08735219B2Publication Date: 2014-05-27
- Inventor: Paul M. Enquist , Gaius Gillman Fountain
- Applicant: Paul M. Enquist , Gaius Gillman Fountain
- Applicant Address: US NC Morrisville
- Assignee: Ziptronix, Inc.
- Current Assignee: Ziptronix, Inc.
- Current Assignee Address: US NC Morrisville
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Main IPC: H01L21/48
- IPC: H01L21/48
Abstract:
A method of integrating a first substrate having a first surface with a first insulating material and a first contact structure with a second substrate having a second surface with a second insulating material and a second contact structure. The first insulating material is directly bonded to the second insulating material. A portion of the first substrate is removed to leave a remaining portion. A third substrate having a coefficient of thermal expansion (CTE) substantially the same as a CTE of the first substrate is bonded to the remaining portion. The bonded substrates are heated to facilitate electrical contact between the first and second contact structures. The third substrate is removed after heating to provided a bonded structure with reliable electrical contacts.
Public/Granted literature
- US20140061949A1 HETEROGENEOUS ANNEALING METHOD AND DEVICE Public/Granted day:2014-03-06
Information query
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