Invention Grant
US08735287B2 Semiconductor packaging process using through silicon vias 有权
半导体封装工艺使用硅通孔

Semiconductor packaging process using through silicon vias
Abstract:
A microelectronic unit can include a semiconductor element having a front surface, a microelectronic semiconductor device adjacent to the front surface, contacts at the front surface and a rear surface remote from the front surface. The semiconductor element can have through holes extending from the rear surface through the semiconductor element and through the contacts. A dielectric layer can line the through holes. A conductive layer may overlie the dielectric layer within the through holes. The conductive layer can conductively interconnect the contacts with unit contacts.
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