Invention Grant
- Patent Title: Curing resin composition
- Patent Title (中): 固化树脂组合物
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Application No.: US13319788Application Date: 2011-04-20
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Publication No.: US08735511B2Publication Date: 2014-05-27
- Inventor: Hirokatsu Shinano , Hiroya Fukunaga , Kazuyuki Itano
- Applicant: Hirokatsu Shinano , Hiroya Fukunaga , Kazuyuki Itano
- Applicant Address: JP Tokyo
- Assignee: Adeka Corporation
- Current Assignee: Adeka Corporation
- Current Assignee Address: JP Tokyo
- Agency: Young & Thompson
- Priority: JP2010-146273 20100628
- International Application: PCT/JP2011/059675 WO 20110420
- International Announcement: WO2012/002028 WO 20120105
- Main IPC: C08F2/50
- IPC: C08F2/50 ; C08G59/50 ; C08G59/68 ; C08G59/72 ; C08L63/02 ; C08L63/04 ; C08L63/06 ; C08L63/08 ; C08L63/10 ; C07C251/32

Abstract:
A curing resin composition that cures in two stages: photo cure and thermal cure, hardly contaminates a liquid or liquid crystals when in contact with, and provides high adhesive strength, particularly a curing composition that photocures sufficiently even when shadowed by TFT wires, a black matrix, etc. in photocuring; and a sealant, a sealant for ODF (one-drop-fill), and an LCD containing the curing resin composition. The curing resin composition contains (A) an oxime ester radical initiator represented by general formula (I), where symbols are as defined in the description, (B) a radical curing resin, (C) a latent epoxy curing agent, and (D) an epoxy resin
Public/Granted literature
- US20120115972A1 CURING RESIN COMPOSITION Public/Granted day:2012-05-10
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