Invention Grant
- Patent Title: Nonvolatile semiconductor memory device
- Patent Title (中): 非易失性半导体存储器件
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Application No.: US13512774Application Date: 2010-11-29
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Publication No.: US08735859B2Publication Date: 2014-05-27
- Inventor: Shuichi Kuboi , Masayuki Takata , Tsukasa Nakai , Hiroyuki Fukumizu , Yasuhiro Nojiri , Kenichi Ootsuka
- Applicant: Shuichi Kuboi , Masayuki Takata , Tsukasa Nakai , Hiroyuki Fukumizu , Yasuhiro Nojiri , Kenichi Ootsuka
- Applicant Address: JP Tokyo
- Assignee: Kabushiki Kaisha Toshiba
- Current Assignee: Kabushiki Kaisha Toshiba
- Current Assignee Address: JP Tokyo
- Agency: Oblon, Spivak, McClelland, Maier & Neustadt, L.L.P.
- Priority: JP2009-272927 20091130
- International Application: PCT/JP2010/071267 WO 20101129
- International Announcement: WO2011/065537 WO 20110603
- Main IPC: H01L29/02
- IPC: H01L29/02

Abstract:
A nonvolatile semiconductor memory device includes: a first interconnect; a second interconnect at a position opposing the first interconnect; and a variable resistance layer between the first interconnect and the second interconnect, the variable resistance layer being capable of reversibly changing between a first state and a second state by a voltage applied via the first interconnect and the second interconnect or a current supplied via the first interconnect and the second interconnect, the first state having a first resistivity, the second state having a second resistivity higher than the first resistivity. Wherein the variable resistance layer has a compound of carbon and silicon as a main component and including hydrogen.
Public/Granted literature
- US20120273743A1 NONVOLATILE SEMICONDUCTOR MEMORY DEVICE Public/Granted day:2012-11-01
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