Invention Grant
US08735861B2 Semiconductor storage device and method of manufacturing same 有权
半导体存储装置及其制造方法

Semiconductor storage device and method of manufacturing same
Abstract:
A semiconductor storage device according to an embodiment includes a first conductive layer, a variable resistance layer, an electrode layer, a first liner layer, a stopper layer, and a second conductive layer. The first liner layer is configured by a material having a property for canceling an influence of an orientation of a lower layer of the first liner layer, the property of the first liner layer being superior compared with that of the stopper layer. The stopper layer is acted upon by an internal stress in a compressive direction at room temperature.
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