Invention Grant
- Patent Title: Semiconductor device
- Patent Title (中): 半导体器件
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Application No.: US13045951Application Date: 2011-03-11
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Publication No.: US08735897B2Publication Date: 2014-05-27
- Inventor: Hidekazu Miyairi , Koji Dairiki , Satoshi Toriumi
- Applicant: Hidekazu Miyairi , Koji Dairiki , Satoshi Toriumi
- Applicant Address: JP Atsugi-shi, Kanagawa-ken
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi, Kanagawa-ken
- Agency: Robinson Intellectual Property Law Office, P.C.
- Agent Eric J. Robinson
- Priority: JP2010-058529 20100315
- Main IPC: H01L29/786
- IPC: H01L29/786

Abstract:
In an inverted staggered thin film transistor, a microcrystalline silicon film and a pair of silicon carbide films are provided between a gate insulating film and wirings serving as a source wiring and a drain wiring. The microcrystalline silicon film is formed on the gate insulating film side and the pair of silicon carbide films are formed on the wiring side. In such a manner, a semiconductor device having favorable electric characteristics can be manufactured with high productivity.
Public/Granted literature
- US20110220907A1 SEMICONDUCTOR DEVICE Public/Granted day:2011-09-15
Information query
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