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US08735937B2 Fully isolated LIGBT and methods for forming the same 有权
完全隔离的LIGBT及其形成方法

Fully isolated LIGBT and methods for forming the same
Abstract:
A device includes a dielectric layer, and a heavily doped semiconductor layer over the dielectric layer. The heavily doped semiconductor layer is of a first conductivity type. A semiconductor region is over the heavily doped semiconductor layer, wherein the semiconductor region is of a second conductivity type opposite the first conductivity type. A Lateral Insulated Gate Bipolar Transistor (LIGBT) is disposed at a surface of the semiconductor region.
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