Invention Grant
- Patent Title: Semiconductor device with superjunction structure
- Patent Title (中): 具有超结构结构的半导体器件
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Application No.: US13290508Application Date: 2011-11-07
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Publication No.: US08735982B2Publication Date: 2014-05-27
- Inventor: Yasuhiko Onishi
- Applicant: Yasuhiko Onishi
- Applicant Address: JP
- Assignee: Fuji Electric Co., Ltd.
- Current Assignee: Fuji Electric Co., Ltd.
- Current Assignee Address: JP
- Agency: Rossi, Kimms & McDowell LLP
- Priority: JP2010-250427 20101109
- Main IPC: H01L29/66
- IPC: H01L29/66

Abstract:
A superjunction semiconductor device is disclosed which has, in the active section, a first alternating-conductivity-type layer which makes a current flow in the ON-state of the device and sustains a bias voltage in the OFF-state of the device. There is a second alternating-conductivity-type layer in a edge-termination section surrounding the active section. The width of a region of a second conductivity type in the second alternating-conductivity-type layer becomes narrower at a predetermined rate from the edge on the active section side toward the edge of the edge termination section. The superjunction semiconductor device facilitates manufacturing the edge-termination section which exhibits a high breakdown voltage and a high reliability for breakdown voltage through a process that exhibits a high mass-productivity.
Public/Granted literature
- US20120112306A1 SEMICONDUCTOR DEVICE WITH SUPERJUNCTION STRUCTURE Public/Granted day:2012-05-10
Information query
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