Invention Grant
- Patent Title: Magnetic tunnel junction for MRAM applications
- Patent Title (中): 用于MRAM应用的磁隧道结
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Application No.: US13941741Application Date: 2013-07-15
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Publication No.: US08736004B2Publication Date: 2014-05-27
- Inventor: Wei Cao , Witold Kula , Chyu-Jiuh Torng
- Applicant: MagIC Technologies, Inc.
- Applicant Address: US CA Milpitas
- Assignee: Headway Technologies, Inc.
- Current Assignee: Headway Technologies, Inc.
- Current Assignee Address: US CA Milpitas
- Agency: Saile Ackerman LLC
- Agent Stephen B. Ackerman
- Main IPC: H01L29/82
- IPC: H01L29/82 ; H01L43/08 ; G11C11/14 ; G11C11/22 ; G11C11/34

Abstract:
Reading margin is improved in a MTJ designed for MRAM applications by employing a pinned layer with an AP2/Ru/AP1 configuration wherein the AP1 layer is a CoFeB/CoFe composite and by forming a MgO tunnel barrier adjacent to the CoFe AP1 layer by a sequence that involves depositing and oxidizing a first Mg layer with a radical oxidation (ROX) process, depositing and oxidizing a second Mg layer with a ROX method, and depositing a third Mg layer on the oxidized second Mg layer. The third Mg layer becomes oxidized during a subsequent anneal. MTJ performance may be further improved by selecting a composite free layer having a Fe/NiFeHf or CoFe/Fe/NiFeHf configuration where the NiFeHf layer adjoins a capping layer in a bottom spin valve configuration. As a result, read margin is optimized simultaneously with improved MR ratio, a reduction in bit line switching current, and a lower number of shorted bits.
Public/Granted literature
- US20130299823A1 Magnetic Tunnel Junction for MRAM Applications Public/Granted day:2013-11-14
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